Surface and Coatings Technology

Journal

Overview
Identity

Publication Venue For

Chemical vapor deposition of Ti-W-C thin films. 148:262-267. 2001

Gas phase analysis of TiCl4 plasma processes by molecular beam mass spectrometry. 148:256-261. 2001

Kinetics and mechanism relevant to TiSiN chemical vapor deposition from TDMAT, silane and ammonia. 148:251-255. 2001

Has Subject Area

Applied Physics

International Standard Serial Number (issn)

0257-8972