Gas phase analysis of TiCl4 plasma processes by molecular beam mass spectrometry

Academic Article

Authors

  • Wierda, DA
  • Reddy, CM
  • Amato-Wierda, Carmela

    • Status

    Publication Date

  • December 3, 2001

    • Has Subject Area

    Published In

    Keywords

  • TiCN, TiN thin films
  • molecular beam mass spectrometry
  • plasma enhanced chemical vapor deposition TiCl4

    • Digital Object Identifier (doi)

    Start Page

  • 256

    • End Page

  • 261

    • Volume

  • 148

    • Issue

  • 2-3