Gas phase analysis of TiCl4 and NH3 plasma processes by molecular beam mass spectrometry

Conference Paper

View record in Web of Science ®

Authors

Reddy, CM

Amato-Wierda, Carmela

Status

published

Publication Date

2001

Published In

FUNDAMENTAL GAS-PHASE AND SURFACE CHEMISTRY OF VAPOR-PHASE DEPOSITION II AND PROCESS CONTROL, DIAGNOSTICS, AND MODELING IN SEMICONDUCTOR MANFACTURING IV Journal

International Standard Book Number (isbn) 10

1-56677-319-9

Start Page

397

End Page

404

Volume

2001

Issue

13