FUNDAMENTAL GAS-PHASE AND SURFACE CHEMISTRY OF VAPOR-PHASE DEPOSITION II AND PROCESS CONTROL, DIAGNOSTICS, AND MODELING IN SEMICONDUCTOR MANFACTURING IV

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Gas phase analysis of TiCl4 and NH3 plasma processes by molecular beam mass spectrometry 2001

Kinetics and mechanism of the thermal decomposition of tetrakis(dimethylamino)titanium 2001